The Effect of Reactive Sputtering on the Microstructure of Parylene-C

The Effect of Reactive Sputtering on the Microstructure of Parylene-C

Sputtering technique involves the use of plasma that locally heats surfaces of substrates during the deposition of atoms or molecules. This modifies the microstructure by increasing crystallinity and the adhesive properties of the substrate. In this study, the effect of sputtering on the microstruct...

Full description

Bibliographic Details
Main Authors: Akeem Raji, Ye-Seul Lee, Seung-Yo Baek, Ji-Hyeon Yoon, Akpeko Gasonoo, Jonghee Lee, Jae-Hyun Lee
Format: Article
Language:English
Published: MDPI AG 2022-07-01
Series:Materials
Subjects:
reactive sputtering
AlN
adhesion properties
thin-film encapsulation
crystallite size
parylene-C/AlN bilayer
Online Access:https://www.mdpi.com/1996-1944/15/15/5203

Internet

https://www.mdpi.com/1996-1944/15/15/5203

Similar Items