Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating

Microvia interconnectors are a critical element of 3D packaging technology, as they provide the shortest interconnection path between stacked chips. However, low efficiency of microvia filling is a long-standing problem. This study proposed a two-step method to enhance the electroplating filling eff...

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Main Authors: Ganglong Li, Zhiyi Li, Junjie Li, Houya Wu
Format: Article
Language:English
Published: MDPI AG 2022-05-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/12/10/1699
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author Ganglong Li
Zhiyi Li
Junjie Li
Houya Wu
author_facet Ganglong Li
Zhiyi Li
Junjie Li
Houya Wu
author_sort Ganglong Li
collection DOAJ
description Microvia interconnectors are a critical element of 3D packaging technology, as they provide the shortest interconnection path between stacked chips. However, low efficiency of microvia filling is a long-standing problem. This study proposed a two-step method to enhance the electroplating filling efficiency by pre-setting metal particles in microvias and later electroplating the Cu to fill the gaps among the pre-settled particles. Since these particles occupy a certain volume in the microvia, less electroplating Cu is needed for microvia filling, leading to a shorter electroplating period.
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spelling doaj.art-6674674b71a2494eb1abb8de416026a22023-11-23T12:26:49ZengMDPI AGNanomaterials2079-49912022-05-011210169910.3390/nano12101699Fast Filling of Microvia by Pre-Settling Particles and Following Cu ElectroplatingGanglong Li0Zhiyi Li1Junjie Li2Houya Wu3School of Mechanical and Electronic Engineering, East China University of Technology, Nanchang 330013, ChinaState Key Laboratory of High Performance Complex Manufacturing, School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, ChinaShenzhen Institute of Advanced Electronic Materials, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, ChinaState Key Laboratory of High Performance Complex Manufacturing, School of Mechanical and Electrical Engineering, Central South University, Changsha 410083, ChinaMicrovia interconnectors are a critical element of 3D packaging technology, as they provide the shortest interconnection path between stacked chips. However, low efficiency of microvia filling is a long-standing problem. This study proposed a two-step method to enhance the electroplating filling efficiency by pre-setting metal particles in microvias and later electroplating the Cu to fill the gaps among the pre-settled particles. Since these particles occupy a certain volume in the microvia, less electroplating Cu is needed for microvia filling, leading to a shorter electroplating period.https://www.mdpi.com/2079-4991/12/10/1699microvia fillingnanoparticleelectroplatingadvanced packaging
spellingShingle Ganglong Li
Zhiyi Li
Junjie Li
Houya Wu
Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating
Nanomaterials
microvia filling
nanoparticle
electroplating
advanced packaging
title Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating
title_full Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating
title_fullStr Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating
title_full_unstemmed Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating
title_short Fast Filling of Microvia by Pre-Settling Particles and Following Cu Electroplating
title_sort fast filling of microvia by pre settling particles and following cu electroplating
topic microvia filling
nanoparticle
electroplating
advanced packaging
url https://www.mdpi.com/2079-4991/12/10/1699
work_keys_str_mv AT ganglongli fastfillingofmicroviabypresettlingparticlesandfollowingcuelectroplating
AT zhiyili fastfillingofmicroviabypresettlingparticlesandfollowingcuelectroplating
AT junjieli fastfillingofmicroviabypresettlingparticlesandfollowingcuelectroplating
AT houyawu fastfillingofmicroviabypresettlingparticlesandfollowingcuelectroplating