Characterization and Modeling of 28-nm Bulk CMOS Technology Down to 4.2 K
This paper presents an experimental investigation, compact modeling, and low-temperature physics-based modeling of a commercial 28-nm bulk CMOS technology operating at cryogenic temperatures. The physical and technological parameters are extracted at 300, 77, and 4.2 K from dc measurements made on v...
| Main Authors: | , , |
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| 格式: | 文件 |
| 语言: | English |
| 出版: |
IEEE
2018-01-01
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| 丛编: | IEEE Journal of the Electron Devices Society |
| 主题: | |
| 在线阅读: | https://ieeexplore.ieee.org/document/8326483/ |