Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs
Abstract In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step cove...
| Autori principali: | , , , , , , , , , , |
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| Natura: | Articolo |
| Lingua: | English |
| Pubblicazione: |
SpringerOpen
2021-11-01
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| Serie: | Nanoscale Research Letters |
| Soggetti: | |
| Accesso online: | https://doi.org/10.1186/s11671-021-03623-x |