Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs

Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs

Abstract In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step cove...

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Bibliographic Details
Main Authors: Yen-Wei Yeh, Su-Hui Lin, Tsung-Chi Hsu, Shouqiang Lai, Po-Tsung Lee, Shui-Yang Lien, Dong-Sing Wuu, Guisen Li, Zhong Chen, Tingzhu Wu, Hao-Chung Kuo
Format: Article
Language:English
Published: SpringerOpen 2021-11-01
Series:Nanoscale Research Letters
Subjects:
ALD
Micro-LED
Passivation
VCSEL
Reliability
Online Access:https://doi.org/10.1186/s11671-021-03623-x

Internet

https://doi.org/10.1186/s11671-021-03623-x

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