Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs
Abstract In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step cove...
| Main Authors: | , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
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SpringerOpen
2021-11-01
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| Series: | Nanoscale Research Letters |
| Subjects: | |
| Online Access: | https://doi.org/10.1186/s11671-021-03623-x |
| _version_ | 1797715310474690560 |
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| author | Yen-Wei Yeh Su-Hui Lin Tsung-Chi Hsu Shouqiang Lai Po-Tsung Lee Shui-Yang Lien Dong-Sing Wuu Guisen Li Zhong Chen Tingzhu Wu Hao-Chung Kuo |
| author_facet | Yen-Wei Yeh Su-Hui Lin Tsung-Chi Hsu Shouqiang Lai Po-Tsung Lee Shui-Yang Lien Dong-Sing Wuu Guisen Li Zhong Chen Tingzhu Wu Hao-Chung Kuo |
| author_sort | Yen-Wei Yeh |
| collection | DOAJ |
| description | Abstract In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step coverage, the characteristics of atomic layer deposition ALD technology are used to solve this problem. ALD utilizes self-limiting interactions between the precursor gas and the substrate surface. When the reactive gas forms a single layer of chemical adsorbed on the substrate surface, no reaction occurs between them and the growth thickness can be controlled. At the Å level, it can provide good step coverage. In this study, recent research on the ALD passivation on micro-light-emitting diodes and vertical cavity surface emitting lasers was reviewed and compared. Several passivation methods were demonstrated to lead to enhanced light efficiency, reduced leakage, and improved reliability. |
| first_indexed | 2024-03-12T08:04:53Z |
| format | Article |
| id | doaj.art-66fda989a7bd4adcb7b64c7c58c6cab2 |
| institution | Directory Open Access Journal |
| issn | 1556-276X |
| language | English |
| last_indexed | 2024-03-12T08:04:53Z |
| publishDate | 2021-11-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Nanoscale Research Letters |
| spelling | doaj.art-66fda989a7bd4adcb7b64c7c58c6cab22023-09-02T19:38:57ZengSpringerOpenNanoscale Research Letters1556-276X2021-11-0116111410.1186/s11671-021-03623-xAdvanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELsYen-Wei Yeh0Su-Hui Lin1Tsung-Chi Hsu2Shouqiang Lai3Po-Tsung Lee4Shui-Yang Lien5Dong-Sing Wuu6Guisen Li7Zhong Chen8Tingzhu Wu9Hao-Chung Kuo10Department of Photonics and Institute of Electro-Optical Engineering, College of Electrical and Computer Engineering, National Yang Ming Chiao Tung UniversityFujian Engineering Research Center for Solid-State Lighting, Xiamen University National Integrated Circuit Industry and Education Integration Innovation Platform, School of Electronic Science and Engineering, Xiamen UniversityDepartment of Photonics and Institute of Electro-Optical Engineering, College of Electrical and Computer Engineering, National Yang Ming Chiao Tung UniversityFujian Engineering Research Center for Solid-State Lighting, Xiamen University National Integrated Circuit Industry and Education Integration Innovation Platform, School of Electronic Science and Engineering, Xiamen UniversityDepartment of Photonics and Institute of Electro-Optical Engineering, College of Electrical and Computer Engineering, National Yang Ming Chiao Tung UniversitySchool of Opto-Electronic and Communication Engineering, Xiamen University of TechnologyDepartment of Materials Science and Engineering, National Chung Hsing UniversityUnicompound Semiconductor CorporationFujian Engineering Research Center for Solid-State Lighting, Xiamen University National Integrated Circuit Industry and Education Integration Innovation Platform, School of Electronic Science and Engineering, Xiamen UniversityFujian Engineering Research Center for Solid-State Lighting, Xiamen University National Integrated Circuit Industry and Education Integration Innovation Platform, School of Electronic Science and Engineering, Xiamen UniversityDepartment of Photonics and Institute of Electro-Optical Engineering, College of Electrical and Computer Engineering, National Yang Ming Chiao Tung UniversityAbstract In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step coverage, the characteristics of atomic layer deposition ALD technology are used to solve this problem. ALD utilizes self-limiting interactions between the precursor gas and the substrate surface. When the reactive gas forms a single layer of chemical adsorbed on the substrate surface, no reaction occurs between them and the growth thickness can be controlled. At the Å level, it can provide good step coverage. In this study, recent research on the ALD passivation on micro-light-emitting diodes and vertical cavity surface emitting lasers was reviewed and compared. Several passivation methods were demonstrated to lead to enhanced light efficiency, reduced leakage, and improved reliability.https://doi.org/10.1186/s11671-021-03623-xALDMicro-LEDPassivationVCSELReliability |
| spellingShingle | Yen-Wei Yeh Su-Hui Lin Tsung-Chi Hsu Shouqiang Lai Po-Tsung Lee Shui-Yang Lien Dong-Sing Wuu Guisen Li Zhong Chen Tingzhu Wu Hao-Chung Kuo Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs Nanoscale Research Letters ALD Micro-LED Passivation VCSEL Reliability |
| title | Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_full | Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_fullStr | Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_full_unstemmed | Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_short | Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs |
| title_sort | advanced atomic layer deposition technologies for micro leds and vcsels |
| topic | ALD Micro-LED Passivation VCSEL Reliability |
| url | https://doi.org/10.1186/s11671-021-03623-x |
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