Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source
The ion beam produced from a plasma sputter-type negative ion source with Zr target was analyzed, and the negative ion beam current was increased by focusing with an electrostatic Einzel lens. An Ar-N2 plasma at 7.0x 10-3 Torr (20%N2) with discharge current voltage=-20 V and discharge current=1.0 A...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
University of the Philippines
1999-12-01
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| Series: | Science Diliman |
| Subjects: | |
| Online Access: | http://journals.upd.edu.ph/index.php/sciencediliman/article/view/243 |