Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source
The ion beam produced from a plasma sputter-type negative ion source with Zr target was analyzed, and the negative ion beam current was increased by focusing with an electrostatic Einzel lens. An Ar-N2 plasma at 7.0x 10-3 Torr (20%N2) with discharge current voltage=-20 V and discharge current=1.0 A...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
University of the Philippines
1999-12-01
|
| Series: | Science Diliman |
| Subjects: | |
| Online Access: | http://journals.upd.edu.ph/index.php/sciencediliman/article/view/243 |
| _version_ | 1818617568597901312 |
|---|---|
| author | Miguel Yambot Alexander Mendenilla Nico Valmoria Henry Ramos Alipio Garcia |
| author_facet | Miguel Yambot Alexander Mendenilla Nico Valmoria Henry Ramos Alipio Garcia |
| author_sort | Miguel Yambot |
| collection | DOAJ |
| description | The ion beam produced from a plasma sputter-type negative ion source with Zr target was analyzed, and the negative ion beam current was increased by focusing with an electrostatic Einzel lens. An Ar-N2 plasma at 7.0x 10-3 Torr (20%N2) with discharge current voltage=-20 V and discharge current=1.0 A was produced for sputter formation of negative ions in the ion source. The Zr target immersed in the plasma was biased at -200 V. The ion beam was analyzed with a retarding potential electrostatic energy analyzer. Lens potentials of 20.0 V for the outer electrodes and -80.3 V for the inner electrode resulted in the highest negative ion beam current, increasing the ion current to 0.5 nA (from 0.28 nA when not using the lens), and reduced the beam spot size to 25 mm (from 35 mm for the unfocused beam). |
| first_indexed | 2024-12-16T17:07:46Z |
| format | Article |
| id | doaj.art-67afb376f4594b98b6aae589825710a1 |
| institution | Directory Open Access Journal |
| issn | 0115-7809 2012-0818 |
| language | English |
| last_indexed | 2024-12-16T17:07:46Z |
| publishDate | 1999-12-01 |
| publisher | University of the Philippines |
| record_format | Article |
| series | Science Diliman |
| spelling | doaj.art-67afb376f4594b98b6aae589825710a12022-12-21T22:23:31ZengUniversity of the PhilippinesScience Diliman0115-78092012-08181999-12-011124446Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion SourceMiguel YambotAlexander MendenillaNico ValmoriaHenry RamosAlipio GarciaThe ion beam produced from a plasma sputter-type negative ion source with Zr target was analyzed, and the negative ion beam current was increased by focusing with an electrostatic Einzel lens. An Ar-N2 plasma at 7.0x 10-3 Torr (20%N2) with discharge current voltage=-20 V and discharge current=1.0 A was produced for sputter formation of negative ions in the ion source. The Zr target immersed in the plasma was biased at -200 V. The ion beam was analyzed with a retarding potential electrostatic energy analyzer. Lens potentials of 20.0 V for the outer electrodes and -80.3 V for the inner electrode resulted in the highest negative ion beam current, increasing the ion current to 0.5 nA (from 0.28 nA when not using the lens), and reduced the beam spot size to 25 mm (from 35 mm for the unfocused beam).http://journals.upd.edu.ph/index.php/sciencediliman/article/view/243negative ion sourceelectrostatic einzel lens |
| spellingShingle | Miguel Yambot Alexander Mendenilla Nico Valmoria Henry Ramos Alipio Garcia Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source Science Diliman negative ion source electrostatic einzel lens |
| title | Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source |
| title_full | Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source |
| title_fullStr | Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source |
| title_full_unstemmed | Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source |
| title_short | Negative Ion Beam Focusing in a Plasma Sputter-type Negative Ion Source |
| title_sort | negative ion beam focusing in a plasma sputter type negative ion source |
| topic | negative ion source electrostatic einzel lens |
| url | http://journals.upd.edu.ph/index.php/sciencediliman/article/view/243 |
| work_keys_str_mv | AT miguelyambot negativeionbeamfocusinginaplasmasputtertypenegativeionsource AT alexandermendenilla negativeionbeamfocusinginaplasmasputtertypenegativeionsource AT nicovalmoria negativeionbeamfocusinginaplasmasputtertypenegativeionsource AT henryramos negativeionbeamfocusinginaplasmasputtertypenegativeionsource AT alipiogarcia negativeionbeamfocusinginaplasmasputtertypenegativeionsource |