Mechanical Properties and Oxidation Behavior of TaWSiN Films

This study explored the structural characteristics, mechanical properties, and oxidation behavior of W-enriched TaWSiN films prepared through co-sputtering. The atomic ratios [W/(W + Ta)] of the as-deposited films maintained a range of 0.77–0.81. The TaWSiN films with a Si content of 0–13 at.% were...

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Bibliographic Details
Main Authors: Chin-Han Tzeng, Li-Chun Chang, Yung-I Chen
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/15/22/8179