Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge

Investigating the Behavior of Thin-Film Formation over Time as a Function of Precursor Concentration and Gas Residence Time in Nitrogen Dielectric Barrier Discharge

This study aims to establish a correlation between the fragmentation process and the growth mechanisms of a coating deposited on a fluoropolymer. Deposition was carried out using dielectric barrier discharge at atmospheric pressure, employing an oxygen-containing organic precursor in a nitrogen envi...

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Bibliographic Details
Main Authors: Faegheh Fotouhiardakani, Alex Destrieux, Jacopo Profili, Morgane Laurent, Sethumadhavan Ravichandran, Gowri Dorairaju, Gaetan Laroche
Format: Article
Language:English
Published: MDPI AG 2024-02-01
Series:Materials
Subjects:
plasma
fluoropolymer
surface treatment
hydrophilicity
coating
dielectric barrier discharge
Online Access:https://www.mdpi.com/1996-1944/17/4/875

Internet

https://www.mdpi.com/1996-1944/17/4/875

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