Substrate-Driven Atomic Layer Deposition of High-κ Dielectrics on 2D Materials

Substrate-Driven Atomic Layer Deposition of High-κ Dielectrics on 2D Materials

Atomic layer deposition (ALD) of high-κ dielectrics on two-dimensional (2D) materials (including graphene and transition metal dichalcogenides) still represents a challenge due to the lack of out-of-plane bonds on the pristine surfaces of 2D materials, thus making the nucleation process highly disad...

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Bibliographic Details
Main Authors: Emanuela Schilirò, Raffaella Lo Nigro, Fabrizio Roccaforte, Filippo Giannazzo
Format: Article
Language:English
Published: MDPI AG 2021-11-01
Series:Applied Sciences
Subjects:
ALD
high-κ
2D materials
graphene
MoS<sub>2</sub>
substrate effect
Online Access:https://www.mdpi.com/2076-3417/11/22/11052

Internet

https://www.mdpi.com/2076-3417/11/22/11052

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