Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography

A four-terminal donor quantum dot (QD) is used to characterize potential barriers between degenerately doped nanoscale contacts. The QD is fabricated by hydrogen-resist lithography on Si(001) in combination with n -type doping by phosphine. The four contacts have different separations ( d  = 9, 12,...

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Main Authors: Nikola Pascher, Szymon Hennel, Susanne Mueller, Andreas Fuhrer
Format: Article
Language:English
Published: IOP Publishing 2016-01-01
Series:New Journal of Physics
Online Access:https://doi.org/10.1088/1367-2630/18/8/083001
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author Nikola Pascher
Szymon Hennel
Susanne Mueller
Andreas Fuhrer
author_facet Nikola Pascher
Szymon Hennel
Susanne Mueller
Andreas Fuhrer
author_sort Nikola Pascher
collection DOAJ
description A four-terminal donor quantum dot (QD) is used to characterize potential barriers between degenerately doped nanoscale contacts. The QD is fabricated by hydrogen-resist lithography on Si(001) in combination with n -type doping by phosphine. The four contacts have different separations ( d  = 9, 12, 16 and 29 nm) to the central 6 nm × 6 nm QD island, leading to different tunnel and capacitive coupling. Cryogenic transport measurements in the Coulomb-blockade (CB) regime are used to characterize these tunnel barriers. We find that field enhancement near the apex of narrow dopant leads is an important effect that influences both barrier breakdown and the magnitude of the tunnel current in the CB transport regime. From CB-spectroscopy measurements, we extract the mutual capacitances between the QD and the four contacts, which scale inversely with the contact separation d . The capacitances are in excellent agreement with numerical values calculated from the pattern geometry in the hydrogen resist. Furthermore, we show that by engineering the source–drain tunnel barriers to be asymmetric, we obtain a much simpler excited-state spectrum of the QD, which can be directly linked to the orbital single-particle spectrum.
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spelling doaj.art-69e96d7c93f14a03bc34d80524e507c52023-08-08T14:27:44ZengIOP PublishingNew Journal of Physics1367-26302016-01-0118808300110.1088/1367-2630/18/8/083001Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithographyNikola Pascher0Szymon Hennel1Susanne Mueller2Andreas Fuhrer3IBM Research—Zurich , Säumerstrasse 4, 8803 Rüschlikon, SwitzerlandSolid State Physics Laboratory , ETH Zurich, 8093 Zurich, SwitzerlandSolid State Physics Laboratory , ETH Zurich, 8093 Zurich, SwitzerlandIBM Research—Zurich , Säumerstrasse 4, 8803 Rüschlikon, SwitzerlandA four-terminal donor quantum dot (QD) is used to characterize potential barriers between degenerately doped nanoscale contacts. The QD is fabricated by hydrogen-resist lithography on Si(001) in combination with n -type doping by phosphine. The four contacts have different separations ( d  = 9, 12, 16 and 29 nm) to the central 6 nm × 6 nm QD island, leading to different tunnel and capacitive coupling. Cryogenic transport measurements in the Coulomb-blockade (CB) regime are used to characterize these tunnel barriers. We find that field enhancement near the apex of narrow dopant leads is an important effect that influences both barrier breakdown and the magnitude of the tunnel current in the CB transport regime. From CB-spectroscopy measurements, we extract the mutual capacitances between the QD and the four contacts, which scale inversely with the contact separation d . The capacitances are in excellent agreement with numerical values calculated from the pattern geometry in the hydrogen resist. Furthermore, we show that by engineering the source–drain tunnel barriers to be asymmetric, we obtain a much simpler excited-state spectrum of the QD, which can be directly linked to the orbital single-particle spectrum.https://doi.org/10.1088/1367-2630/18/8/083001
spellingShingle Nikola Pascher
Szymon Hennel
Susanne Mueller
Andreas Fuhrer
Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography
New Journal of Physics
title Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography
title_full Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography
title_fullStr Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography
title_full_unstemmed Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography
title_short Tunnel barrier design in donor nanostructures defined by hydrogen-resist lithography
title_sort tunnel barrier design in donor nanostructures defined by hydrogen resist lithography
url https://doi.org/10.1088/1367-2630/18/8/083001
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AT szymonhennel tunnelbarrierdesignindonornanostructuresdefinedbyhydrogenresistlithography
AT susannemueller tunnelbarrierdesignindonornanostructuresdefinedbyhydrogenresistlithography
AT andreasfuhrer tunnelbarrierdesignindonornanostructuresdefinedbyhydrogenresistlithography