Deuterium plasma exposure of thin oxide films on tungsten - oxygen removal and deuterium uptake

Recently we have shown that thin (33 to 55 nm) oxide films on tungsten (W) prevent deuterium (D) uptake from a low-temperature plasma (5 eV/D; 370 K; 1.4 × 1024 D/m2) into metallic W. Here we continue this investigation with higher D fluence up to 2.3 × 1025 D/m2 and, additionally, with higher D ene...

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Bibliographic Details
Main Authors: Kristof Kremer, Thomas Schwarz-Selinger, Wolfgang Jacob
Format: Article
Language:English
Published: Elsevier 2023-06-01
Series:Nuclear Materials and Energy
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2352179123000455