Influence of a Revolutionary Substrate on Hysteresis Effect in Reactive Sputtering Deposition of Vanadium Oxide
<p><span lang="EN-US">Reactive sputter processes frequently exhibit stability problems. The cause of this is that these processes normally exhibit hysteresis effects in the processing curves. Eliminating or decreasing the hysteresis would significantly simplify the use of react...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Kaunas University of Technology
2016-05-01
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| Series: | Medžiagotyra |
| Subjects: | |
| Online Access: | http://matsc.ktu.lt/index.php/MatSc/article/view/7569 |