Quantitative characterization of topographic defects of semiconductor silicon wafers
The calculation of shadow images of the surfaces of semiconductor silicon wafers obtained by Makyoh topography is carried out. A quantitative relationship between the intensity of the shadow spots on the topogram and the micro geometric parameters of the silicon wafers has been established. The soft...
| Egile Nagusiak: | , , |
|---|---|
| Formatua: | Artikulua |
| Hizkuntza: | Russian |
| Argitaratua: |
Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
|
| Saila: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Gaiak: | |
| Sarrera elektronikoa: | https://doklady.bsuir.by/jour/article/view/1005 |