The Influence of Ion Beam Bombardment on the Properties of High Laser-Induced Damage Threshold HfO<sub>2</sub> Thin Films
HfO<sub>2</sub> thin films were deposited on BK-7 glass substrates using an electron beam evaporation deposition (EBD) technique and then post-treated with argon and oxygen ions at an ion energy ranging from 800 to 1200 eV. The optical properties, laser damage resistance, and surface mor...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2022-01-01
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| Series: | Crystals |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2073-4352/12/1/117 |