A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films

A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films

The discovery of ferroelectricity in HfO<sub>2</sub>-based materials in 2011 provided new research directions and opportunities. In particular, for atomic layer deposited Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> (HZO) films, it is possible to obta...

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Bibliographic Details
Main Authors: Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, Su Min Hwang, Namhun Kim, Yong Chan Jung, Akshay Sahota, Kihyun Kim, Hyun-Yong Yu, Pil-Ryung Cha, Chadwin D. Young, Rino Choi, Jinho Ahn, Jiyoung Kim
Format: Article
Language:English
Published: MDPI AG 2020-07-01
Series:Materials
Subjects:
atomic layer deposition
ferroelectric film
Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub>
low thermal budget process
TiN electrode
Online Access:https://www.mdpi.com/1996-1944/13/13/2968

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