Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation

Molecular Dynamics of Atomic Layer Deposition: Sticking Coefficient Investigation

This study focused on the atomic scale growth dynamics of amorphous Al<sub>2</sub>O<sub>3</sub> films microscale structural relaxation. Classical Molecular Dynamics (MD) can not entirely model the challenging ALD dynamics due to the large timescales. The all-atom approach has...

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Bibliographic Details
Main Authors: Thokozane Justin Kunene, Lagouge Kwanda Tartibu, Sina Karimzadeh, Peter Ozaveshe Oviroh, Kingsley Ukoba, Tien-Chien Jen
Format: Article
Language:English
Published: MDPI AG 2022-02-01
Series:Applied Sciences
Subjects:
atomic layer deposition
film thickness
molecular dynamics
sticking coefficient
Online Access:https://www.mdpi.com/2076-3417/12/4/2188

Internet

https://www.mdpi.com/2076-3417/12/4/2188

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