A Direct n<sup>+</sup>-Formation Process by Magnetron Sputtering an Inter-Layer Dielectric for Self-Aligned Coplanar Indium Gallium Zinc Oxide Thin-Film Transistors

A Direct n<sup>+</sup>-Formation Process by Magnetron Sputtering an Inter-Layer Dielectric for Self-Aligned Coplanar Indium Gallium Zinc Oxide Thin-Film Transistors

An inter-layer dielectric (ILD) deposition process to simultaneously form the conductive regions of self-aligned (SA) coplanar In-Ga-Zn-O (IGZO) thin-film transistors (TFTs) is demonstrated. N<sup>+</sup>-IGZO regions and excellent ohmic contact can be obtained without additional steps b...

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Bibliographic Details
Main Authors: Xinlv Duan, Congyan Lu, Xichen Chuai, Qian Chen, Guanhua Yang, Di Geng
Format: Article
Language:English
Published: MDPI AG 2022-04-01
Series:Micromachines
Subjects:
self-aligned coplanar
IGZO TFT
S/D region
n<sup>+</sup>-formation
magnetron sputtering inter-layer dielectric
Online Access:https://www.mdpi.com/2072-666X/13/5/652

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https://www.mdpi.com/2072-666X/13/5/652

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