Chemical deposition of Cu2O films with ultra-low resistivity: correlation with the defect landscape

Chemical deposition of Cu2O films with ultra-low resistivity: correlation with the defect landscape

Cu2O offers a lot of potential for several optoelectronic applications. Here, the authors present a low temperature, fast and scalable approach to deposit Cu2O films with low resistivity, which is correlated to the defect landscape in the material.

Bibliographic Details
Main Authors: Abderrahime Sekkat, Maciej Oskar Liedke, Viet Huong Nguyen, Maik Butterling, Federico Baiutti, Juan de Dios Sirvent Veru, Matthieu Weber, Laetitia Rapenne, Daniel Bellet, Guy Chichignoud, Anne Kaminski-Cachopo, Eric Hirschmann, Andreas Wagner, David Muñoz-Rojas
Format: Article
Language:English
Published: Nature Portfolio 2022-09-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-022-32943-4

Internet

https://doi.org/10.1038/s41467-022-32943-4

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