Characterization of the Copper Oxide Thin Films Deposited by Dc Sputtering Technique
Nanocrystalline Copper Oxide films were deposited on glass substrates by plasma dc sputtering. The effected of discharge current on the structural and optical properties of sputtered films were studied .X-ray diffraction peak of Cu2O (111) and Cu4O3 (112) direction was observed at discharge current...
| Principais autores: | , , |
|---|---|
| Formato: | Artigo |
| Idioma: | English |
| Publicado em: |
Unviversity of Technology- Iraq
2014-04-01
|
| coleção: | Engineering and Technology Journal |
| Acesso em linha: | https://etj.uotechnology.edu.iq/article_102605_2da59aa64842727151d0ca97c99d8954.pdf |