Influence of Cu impurities and surface temperature to the formation of thin a-C:H(Me) film
The aim of this experimental work is identify most important physical and chemical processes on the surface during amorphous carbon films formation on the silicon surface with copper nanoclusters (Cu). Duration of films deposition on n type silicon (100) surface by using different substrate tempera...
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| Format: | Article |
| Language: | English |
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Al-Farabi Kazakh National University
2019-12-01
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| Series: | Physical Sciences and Technology |
| Online Access: | http://phst/index.php/journal/article/view/181 |