Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond

Atomistic understanding of rough surface on the interfacial friction behavior during the chemical mechanical polishing process of diamond

Abstract The roughness of the contact surface exerts a vital role in rubbing. It is still a significant challenge to understand the microscopic contact of the rough surface at the atomic level. Herein, the rough surface with a special root mean square (RMS) value is constructed by multivariate Weier...

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Bibliographic Details
Main Authors: Song Yuan, Xiaoguang Guo, Hao Wang, Renke Kang, Shang Gao
Format: Article
Language:English
Published: SpringerOpen 2023-07-01
Series:Friction
Subjects:
diamond
random roughness
reactive force field molecular dynamics (ReaxFF MD)
friction
Weierstrass–Mandelbrot (W–M) function
chemical mechanical polishing (CMP)
Online Access:https://doi.org/10.1007/s40544-023-0760-8

Internet

https://doi.org/10.1007/s40544-023-0760-8

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