Black silicon morphologies using conventional RIE processing

Black silicon morphologies using conventional RIE processing

We report on the use of conventional non-Bosch, non-cryogenic Reactive Ion Etching (RIE) processing to produce a range of low optical reflection morphologies on <100> silicon wafer. Tapered structures and nano dendritic-pillars are patterned into silicon over a pressure range of 550 - 700 mTor...

Full description

Bibliographic Details
Main Authors: Zahidur R. Chowdhury, Joel Y. Y. Loh, Md. Nishanto Nahid Pishon, Nazir P. Kherani
Format: Article
Language:English
Published: AIP Publishing LLC 2017-05-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4984215

Internet

http://dx.doi.org/10.1063/1.4984215

Similar Items