Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au

AZO interlayers between n-Ga2O3 and Ti/Au metallization significantly enhance Ohmic contact formation after annealing at ≥ 300°C. Without the presence of the AZO, similar anneals produce only rectifying current-voltage characteristics. Transmission Line Measurements of the Au/Ti/AZO/Ga2O3 stacks sho...

Full description

Bibliographic Details
Main Authors: Patrick H. Carey IV, Jiancheng Yang, F. Ren, David C. Hays, S. J. Pearton, Soohwan Jang, Akito Kuramata, Ivan I. Kravchenko
Format: Article
Language:English
Published: AIP Publishing LLC 2017-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4996172
_version_ 1819179832993382400
author Patrick H. Carey IV
Jiancheng Yang
F. Ren
David C. Hays
S. J. Pearton
Soohwan Jang
Akito Kuramata
Ivan I. Kravchenko
author_facet Patrick H. Carey IV
Jiancheng Yang
F. Ren
David C. Hays
S. J. Pearton
Soohwan Jang
Akito Kuramata
Ivan I. Kravchenko
author_sort Patrick H. Carey IV
collection DOAJ
description AZO interlayers between n-Ga2O3 and Ti/Au metallization significantly enhance Ohmic contact formation after annealing at ≥ 300°C. Without the presence of the AZO, similar anneals produce only rectifying current-voltage characteristics. Transmission Line Measurements of the Au/Ti/AZO/Ga2O3 stacks showed the specific contact resistance and transfer resistance decreased sharply from as-deposited values with annealing. The minimum contact resistance and specific contact resistance of 0.42 Ω-mm and 2.82 × 10-5 Ω-cm2 were achieved after a relatively low temperature 400°C annealing. The conduction band offset between AZO and Ga2O3 is 0.79 eV and provides a favorable pathway for improved electron transport across this interface.
first_indexed 2024-12-22T22:04:43Z
format Article
id doaj.art-727658906e094e1192d9ed7f1a44d219
institution Directory Open Access Journal
issn 2158-3226
language English
last_indexed 2024-12-22T22:04:43Z
publishDate 2017-09-01
publisher AIP Publishing LLC
record_format Article
series AIP Advances
spelling doaj.art-727658906e094e1192d9ed7f1a44d2192022-12-21T18:11:01ZengAIP Publishing LLCAIP Advances2158-32262017-09-0179095313095313-610.1063/1.4996172086708ADVOhmic contacts on n-type β-Ga2O3 using AZO/Ti/AuPatrick H. Carey IV0Jiancheng Yang1F. Ren2David C. Hays3S. J. Pearton4Soohwan Jang5Akito Kuramata6Ivan I. Kravchenko7Department of Chemical Engineering, University of Florida, Gainesville, FL 32611, USADepartment of Chemical Engineering, University of Florida, Gainesville, FL 32611, USADepartment of Chemical Engineering, University of Florida, Gainesville, FL 32611, USADepartment of Materials Science and Engineering, University of Florida, Gainesville, FL 32611, USADepartment of Materials Science and Engineering, University of Florida, Gainesville, FL 32611, USADepartment of Chemical Engineering, Dankook University, Yongin 16890, KoreaTamura Corporation, Sayama, Saitama 350-1328, Japan and Novel Crystal Technology, Inc., Sayama, Saitama 350-1328, JapanCenter for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37830, USAAZO interlayers between n-Ga2O3 and Ti/Au metallization significantly enhance Ohmic contact formation after annealing at ≥ 300°C. Without the presence of the AZO, similar anneals produce only rectifying current-voltage characteristics. Transmission Line Measurements of the Au/Ti/AZO/Ga2O3 stacks showed the specific contact resistance and transfer resistance decreased sharply from as-deposited values with annealing. The minimum contact resistance and specific contact resistance of 0.42 Ω-mm and 2.82 × 10-5 Ω-cm2 were achieved after a relatively low temperature 400°C annealing. The conduction band offset between AZO and Ga2O3 is 0.79 eV and provides a favorable pathway for improved electron transport across this interface.http://dx.doi.org/10.1063/1.4996172
spellingShingle Patrick H. Carey IV
Jiancheng Yang
F. Ren
David C. Hays
S. J. Pearton
Soohwan Jang
Akito Kuramata
Ivan I. Kravchenko
Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au
AIP Advances
title Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au
title_full Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au
title_fullStr Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au
title_full_unstemmed Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au
title_short Ohmic contacts on n-type β-Ga2O3 using AZO/Ti/Au
title_sort ohmic contacts on n type β ga2o3 using azo ti au
url http://dx.doi.org/10.1063/1.4996172
work_keys_str_mv AT patrickhcareyiv ohmiccontactsonntypebga2o3usingazotiau
AT jianchengyang ohmiccontactsonntypebga2o3usingazotiau
AT fren ohmiccontactsonntypebga2o3usingazotiau
AT davidchays ohmiccontactsonntypebga2o3usingazotiau
AT sjpearton ohmiccontactsonntypebga2o3usingazotiau
AT soohwanjang ohmiccontactsonntypebga2o3usingazotiau
AT akitokuramata ohmiccontactsonntypebga2o3usingazotiau
AT ivanikravchenko ohmiccontactsonntypebga2o3usingazotiau