Internal Stress in the Porous Anodic Alumina/Aluminum System

The internal stresses of the aluminum films deposited at various substrate temperatures and evaporation rates are studied. It is shown that tensile stresses are present in the aluminum film. The tensile stresses values are equal to (1.0- 3.5)´107 N/m2 to be comparable with the aluminum yield point (...

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Main Authors: Valentina YAKOVTSEVA, Vladimir SHULGOV, Dzmitry SHIMANOVICH
Format: Article
Language:English
Published: IFSA Publishing, S.L. 2021-01-01
Series:Sensors & Transducers
Subjects:
Online Access:https://sensorsportal.com/HTML/DIGEST/january_2021/Vol_248/P_3200.pdf
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author Valentina YAKOVTSEVA
Vladimir SHULGOV
Dzmitry SHIMANOVICH
author_facet Valentina YAKOVTSEVA
Vladimir SHULGOV
Dzmitry SHIMANOVICH
author_sort Valentina YAKOVTSEVA
collection DOAJ
description The internal stresses of the aluminum films deposited at various substrate temperatures and evaporation rates are studied. It is shown that tensile stresses are present in the aluminum film. The tensile stresses values are equal to (1.0- 3.5)´107 N/m2 to be comparable with the aluminum yield point (2.3´107 N/m2). Theoretical and experimental studies of deformation and stress at the porous aluminum oxide-aluminum interface are discussed. It is shown that the internal stresses in the growing porous oxide are always compressive stresses and practically do not depend on the internal stresses in the initial aluminum film. The last testifies the fact of reaching the aluminum yield point at the oxide formation.
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spelling doaj.art-729cac5b1ee7489988d2fbb83fca60402023-08-05T09:13:00ZengIFSA Publishing, S.L.Sensors & Transducers2306-85151726-54792021-01-0124813035Internal Stress in the Porous Anodic Alumina/Aluminum SystemValentina YAKOVTSEVA0Vladimir SHULGOV1Dzmitry SHIMANOVICH2Belarusian State University of Informatics and RadioelectronicsBelarusian State University of Informatics and RadioelectronicsBelarusian State University of Informatics and RadioelectronicsThe internal stresses of the aluminum films deposited at various substrate temperatures and evaporation rates are studied. It is shown that tensile stresses are present in the aluminum film. The tensile stresses values are equal to (1.0- 3.5)´107 N/m2 to be comparable with the aluminum yield point (2.3´107 N/m2). Theoretical and experimental studies of deformation and stress at the porous aluminum oxide-aluminum interface are discussed. It is shown that the internal stresses in the growing porous oxide are always compressive stresses and practically do not depend on the internal stresses in the initial aluminum film. The last testifies the fact of reaching the aluminum yield point at the oxide formation.https://sensorsportal.com/HTML/DIGEST/january_2021/Vol_248/P_3200.pdfaluminumanodic aluminatwo-layer systeminternal stressdeformation
spellingShingle Valentina YAKOVTSEVA
Vladimir SHULGOV
Dzmitry SHIMANOVICH
Internal Stress in the Porous Anodic Alumina/Aluminum System
Sensors & Transducers
aluminum
anodic alumina
two-layer system
internal stress
deformation
title Internal Stress in the Porous Anodic Alumina/Aluminum System
title_full Internal Stress in the Porous Anodic Alumina/Aluminum System
title_fullStr Internal Stress in the Porous Anodic Alumina/Aluminum System
title_full_unstemmed Internal Stress in the Porous Anodic Alumina/Aluminum System
title_short Internal Stress in the Porous Anodic Alumina/Aluminum System
title_sort internal stress in the porous anodic alumina aluminum system
topic aluminum
anodic alumina
two-layer system
internal stress
deformation
url https://sensorsportal.com/HTML/DIGEST/january_2021/Vol_248/P_3200.pdf
work_keys_str_mv AT valentinayakovtseva internalstressintheporousanodicaluminaaluminumsystem
AT vladimirshulgov internalstressintheporousanodicaluminaaluminumsystem
AT dzmitryshimanovich internalstressintheporousanodicaluminaaluminumsystem