Using Temporally Synthesized Laser Pulses to Enhance the Conversion Efficiency of Sn Plasmas for EUV Lithography
We have studied the laser pulse shape dependence of the conversion efficiency of λ = 1.03 μm laser pulse energy into 13.5 nm extreme ultraviolet (EUV) emission from a Sn laser-produced plasma. Laser pulses of arbitrary temporal shape ranging from hundreds of picoseconds to seve...
Main Authors: | , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
IEEE
2021-01-01
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Series: | IEEE Photonics Journal |
Subjects: | |
Online Access: | https://ieeexplore.ieee.org/document/9311829/ |