Nanofabrication and Demonstration of a Direct‐Write Microevaporator

Nanofabrication and Demonstration of a Direct‐Write Microevaporator

Direct‐write vapor deposition is a new technique that would enable one‐step 3D maskless nanofabrication on a variety of substrates. A novel silicon chip‐based microevaporator is developed that allows evaporant to exit through 2000–300 nm nozzles while held at distances comparable to the nozzle diame...

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Bibliographic Details
Main Authors: Xella Doi, Pavani Vamsi Krishna Nittala, Brian Fu, Kyaw Zin Latt, Suryakant Mishra, Luke Silverman, Linus Woodard, Ralu Divan, Supratik Guha
Format: Article
Language:English
Published: Wiley-VCH 2024-02-01
Series:Small Science
Subjects:
direct write
heterogeneous integration
high-aspect-ratio etch
nanofabrication
physical vapor deposition
Online Access:https://doi.org/10.1002/smsc.202300121

Internet

https://doi.org/10.1002/smsc.202300121

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