Inverse Reticle Optimization With Quantum Annealing and Hybrid Solvers

Inverse Reticle Optimization With Quantum Annealing and Hybrid Solvers

Reticle optimization is a computationally demanding task in optical microlithography for advanced semiconductor fabrication. In this study, we explore the effectiveness of D-Wave’s quantum annealing (QA) and hybrid steepest descent (SD) solvers in solving pixelated binary reticle optimiza...

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Bibliographic Details
Main Authors: Po-Hsun Fang, Yan-Syun Chen, Jhih-Sheng Wu, Peichen Yu
Format: Article
Language:English
Published: IEEE 2024-01-01
Series:IEEE Access
Subjects:
Inverse lithography technology
optical proximity correction
quantum annealing
quantum computing
semiconductor
Online Access:https://ieeexplore.ieee.org/document/10445252/

Internet

https://ieeexplore.ieee.org/document/10445252/

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