Deposition and characterization of amorphous carbon thin film
The amorphous carbon thin films of 500 nm thickness was deposited on Si (100) and stainless steel (SS) substrates by filtered cathodic vacuum arc (FCVA) technique. The 100 nm chromium interlayer was deposited by R.F. magnetron sputtering system to improve the adhesion strength between the substrate...
| Hlavní autoři: | , , , , |
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| Médium: | Článek |
| Jazyk: | English |
| Vydáno: |
Applied Science Innovations Private Limited
2016-12-01
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| Edice: | Carbon: Science and Technology |
| Témata: | |
| On-line přístup: | http://www.applied-science-innovations.com/cst-web-site/CST-8-4-2016/CST-224-8-4-2016-43-47.pdf |