Bias Stress Stability of Solution-Processed Nano Indium Oxide Thin Film Transistor

Bias Stress Stability of Solution-Processed Nano Indium Oxide Thin Film Transistor

In this paper, the effects of annealing temperature and other process parameters on spin-coated indium oxide thin film transistors (In<sub>2</sub>O<sub>3</sub>-TFTs) were studied. The research shows that plasma pretreatment of glass substrate can improve the hydrophilicity of...

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Bibliographic Details
Main Authors: Rihui Yao, Xiao Fu, Wanwan Li, Shangxiong Zhou, Honglong Ning, Biao Tang, Jinglin Wei, Xiuhua Cao, Wei Xu, Junbiao Peng
Format: Article
Language:English
Published: MDPI AG 2021-01-01
Series:Micromachines
Subjects:
indium oxide thin film
solution method
plasma surface treatment
annealing temperature
bias stability
Online Access:https://www.mdpi.com/2072-666X/12/2/111

Internet

https://www.mdpi.com/2072-666X/12/2/111

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