Ultra-Thin Integrated ALD Al<sub>2</sub>O<sub>3</sub> Electron-Transparent Windows for TEM Nanoreactor Applications

Ultra-Thin Integrated ALD Al<sub>2</sub>O<sub>3</sub> Electron-Transparent Windows for TEM Nanoreactor Applications

<b> </b>This paper presents for the first time, the integration of ultra-thin (&lt;10 nm) atomic layer deposition (ALD) aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) membranes as electron transparent windows (ETWs) for transmission electron microscope (TEM) nan...

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Bibliographic Details
Main Authors: Levar Goossen, Jia Wei, Gregory Pandraud, Violeta Prodanovic, Pasqualina M. Sarro
Format: Article
Language:English
Published: MDPI AG 2018-12-01
Series:Proceedings
Subjects:
nanoreactor
ultra-thin membrane
ALD Al<sub>2</sub>O<sub>3</sub>
electron transparent windows
Online Access:https://www.mdpi.com/2504-3900/2/13/1001
Description
Summary:<b> </b>This paper presents for the first time, the integration of ultra-thin (&lt;10 nm) atomic layer deposition (ALD) aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) membranes as electron transparent windows (ETWs) for transmission electron microscope (TEM) nanoreactor applications. The process was successfully implemented and tested in a TEM. ETWs with thicknesses down to 5 and 10 nm were used to image nanoparticles (NPs) in a 120 keV TEM and 200 keV TEM respectively.
ISSN:2504-3900

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