Ultra-Thin Integrated ALD Al<sub>2</sub>O<sub>3</sub> Electron-Transparent Windows for TEM Nanoreactor Applications

Ultra-Thin Integrated ALD Al<sub>2</sub>O<sub>3</sub> Electron-Transparent Windows for TEM Nanoreactor Applications

<b> </b>This paper presents for the first time, the integration of ultra-thin (<10 nm) atomic layer deposition (ALD) aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) membranes as electron transparent windows (ETWs) for transmission electron microscope (TEM) nan...

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Bibliographic Details
Main Authors:	Levar Goossen, Jia Wei, Gregory Pandraud, Violeta Prodanovic, Pasqualina M. Sarro
Format:	Article
Language:	English
Published:	MDPI AG 2018-12-01
Series:	Proceedings
Subjects:	nanoreactor ultra-thin membrane ALD Al<sub>2</sub>O<sub>3</sub> electron transparent windows
Online Access:	https://www.mdpi.com/2504-3900/2/13/1001

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