Atomic layer deposition of chalcogenide thin films: processes, film properties, applications, and bibliometric prospect

The use of atomic layer deposition (ALD) for the deposition of chalcogenide thin films have offered great potential applications in numerous research areas such as change-memory storage, sensors, solar cells, photocatalysis, and batteries, but advancing in these fields of research without understand...

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Bibliographic Details
Main Authors: James A. Oke, Olufunsho O. Olotu, Tien-Chien Jen
Format: Article
Language:English
Published: Elsevier 2022-09-01
Series:Journal of Materials Research and Technology
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785422011383