Fabrication of bit patterned media using templated two-phase growth
In fabricating high areal density magnetic nanostructures for bit patterned magnetic recording media, conventional lithography methods are limited in scaling and often present other challenges, for instance, as etch-damage in case of subtractive schemes. In this paper, we present a novel two-phase g...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2017-02-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/1.4974866 |