Special Issue “ALD Technique for Functional Coatings of Nanostructured Materials”
Atomic layer deposition (ALD) is a vapor-phase technique that consists of the alternation of separated self-limiting surface reactions, which enable film thickness to be accurately controlled at the angstrom level, based on the former atomic layer epitaxy method [...]
| Κύριοι συγγραφείς: | , , |
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| Μορφή: | Άρθρο |
| Γλώσσα: | English |
| Έκδοση: |
MDPI AG
2022-10-01
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| Σειρά: | Nanomaterials |
| Θέματα: | |
| Διαθέσιμο Online: | https://www.mdpi.com/2079-4991/12/19/3489 |