Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers

Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers

Integrating optically active III-V materials on silicon/insulator platforms is one potential path towards improving the energy efficiency and performance of modern computing. Here we demonstrate the applicability of direct wafer bonding combined with plasma etching to the fabrication of complex nano...

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Bibliographic Details
Main Authors: Jakub Dranczewski, Anna Fischer, Preksha Tiwari, Markus Scherrer, Dhruv Saxena, Heinz Schmid, Riccardo Sapienza, Kirsten Moselund
Format: Article
Language:English
Published: Elsevier 2023-06-01
Series:Micro and Nano Engineering
Subjects:
III-V nanofabrication
Plasma etching optimisation
Integrated lasers
InP nanolasers
Semiconductor networks
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007223000266

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http://www.sciencedirect.com/science/article/pii/S2590007223000266

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