Inertial focusing in a parallelogram profiled microchannel over a range of aspect ratios
Abstract In this study, particle focusing phenomena are studied in parallelogram and rectangular cross-sectioned microchannels of varying aspect ratio. In contrast to prior work the microchannels were fabricated using anisotropic wet etching of a Si wafer, plasma bonding, and self-alignment between...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2019-12-01
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| Series: | Micro and Nano Systems Letters |
| Subjects: | |
| Online Access: | https://doi.org/10.1186/s40486-019-0102-9 |