Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask
Two-dimensional (2D) atomic crystals and their hybrid structures have recently attracted much attention due to their potential applications. The fabrication of metallic contacts or nanostructures on 2D materials is very common and generally achieved by performing electron-beam (e-beam) lithography....
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2014-06-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4884305 |