The Structural and Optical Properties of Hydrogenated and Nitrogenated a-Si0.1Ge0.9 and a-Si0.1Ge0.9:3% B Thin Films

It is shown that pure and 3% boron doped a-Si0.1Ge0.9:H and a-Si0.1Ge0.9:N thin films could be prepared by flash evaporation processes. The hydrogenation and nitrogenation are very successful in situ after depositing the films. The FT-IR analysis gave all the known absorbing bonds of hydrogen and n...

Full description

Bibliographic Details
Main Author: M. F. A. Alias
Format: Article
Language:English
Published: University of Baghdad 2009-10-01
Series:Iraqi Journal of Physics
Subjects:
Online Access:https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/899