Uniformity of HfO<sub>2</sub> Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition

Uniformity of HfO<sub>2</sub> Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition

In this study, we assessed the physical and chemical properties of HfO<sub>2</sub> thin films deposited by plasma-enhanced atomic layer deposition (PEALD). We confirmed the self-limiting nature of the surface reactions involved in the HfO<sub>2</sub> thin film’s growth by tra...

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Bibliographic Details
Main Authors: Boyun Choi, Hyeong-U Kim, Nari Jeon
Format: Article
Language:English
Published: MDPI AG 2022-12-01
Series:Nanomaterials
Subjects:
plasma-enhanced atomic layer deposition
hafnium oxides
uniformity of thin films
wafer-scale uniformity
high aspect ratio
trench structures
Online Access:https://www.mdpi.com/2079-4991/13/1/161

Internet

https://www.mdpi.com/2079-4991/13/1/161

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