CuO/PMMA Polymer Nanocomposites as Novel Resist Materials for E-Beam Lithography
Polymer nanocomposites have emerged as a new powerful class of materials because of their versatility, adaptability and wide applicability to a variety of fields. In this work, a facile and cost-effective method to develop poly(methyl methacrylate) (PMMA)-based polymer nanocomposites with copper oxi...
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-03-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/11/3/762 |