Adhesion at TiNi interfaces with Ta, Mo and Si

Atomic and electronic structure of (001) and (110) interfaces between TiNi and Ta, Mo, Si thin films are investigated by ab-initio method within density functional theory. It is shown that high adhesion properties can be attained at the Mo/TiNi(001)Ti interface, whereas the work of separation of Ta...

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Bibliographic Details
Main Authors: Bakulin Alexander, Tarasov Konstantin, Meisner Lyudmila, Kulkova Svetlana
Format: Article
Language:English
Published: EDP Sciences 2015-01-01
Series:MATEC Web of Conferences
Online Access:http://dx.doi.org/10.1051/matecconf/20153303006