On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas
In this paper, we study the plasma-less etching of crystalline silicon (c-Si) by F<sub>2</sub>/N<sub>2</sub> gas mixture at moderately elevated temperatures. The etching is performed in an inline etching tool, which is specifically developed to lower costs for products needin...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2020-11-01
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| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/10/11/2214 |