On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

In this paper, we study the plasma-less etching of crystalline silicon (c-Si) by F<sub>2</sub>/N<sub>2</sub> gas mixture at moderately elevated temperatures. The etching is performed in an inline etching tool, which is specifically developed to lower costs for products needin...

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Bibliographic Details
Main Authors: Bishal Kafle, Ahmed Ismail Ridoy, Eleni Miethig, Laurent Clochard, Edward Duffy, Marc Hofmann, Jochen Rentsch
Format: Article
Language:English
Published: MDPI AG 2020-11-01
Series:Nanomaterials
Subjects:
dry etching
black silicon
photovoltaics
Online Access:https://www.mdpi.com/2079-4991/10/11/2214

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