The breakdown of Moore’s law induced by weak Anderson localization and by size effects in nano-scale metallic connectors
We report the resistivity measured at temperatures between 5 K and 300 K of a Cu film 63 nm thick with grains that have a diameter d = 10.5 nm on the average. The resistivity of this film is described by the first quantum theory of resistivity of nano-scale metallic connectors [R C Munoz et al , App...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2021-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/abd422 |