Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields
Abstract Laser direct-writing enables micro and nanoscale patterning, and is thus widely used for cutting-edge research and industrial applications. Various nanolithography methods, such as near-field, plasmonic, and scanning-probe lithography, are gaining increasing attention because they enable fa...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2022-09-01
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| Series: | Microsystems & Nanoengineering |
| Online Access: | https://doi.org/10.1038/s41378-022-00416-9 |
| _version_ | 1798000655861809152 |
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| author | Changsu Park Soobin Hwang Donghyun Kim Nahyun Won Runjia Han Seonghyeon Jeon Wooyoung Shim Jiseok Lim Chulmin Joo Shinill Kang |
| author_facet | Changsu Park Soobin Hwang Donghyun Kim Nahyun Won Runjia Han Seonghyeon Jeon Wooyoung Shim Jiseok Lim Chulmin Joo Shinill Kang |
| author_sort | Changsu Park |
| collection | DOAJ |
| description | Abstract Laser direct-writing enables micro and nanoscale patterning, and is thus widely used for cutting-edge research and industrial applications. Various nanolithography methods, such as near-field, plasmonic, and scanning-probe lithography, are gaining increasing attention because they enable fabrication of high-resolution nanopatterns that are much smaller than the wavelength of light. However, conventional methods are limited by low throughput and scalability, and tend to use electron beams or focused-ion beams to create nanostructures. In this study, we developed a procedure for massively parallel direct writing of nanoapertures using a multi-optical probe system and super-resolution near-fields. A glass micro-Fresnel zone plate array, which is an ultra-precision far-field optical system, was designed and fabricated as the multi-optical probe system. As a chalcogenide phase-change material (PCM), multiple layers of Sb65Se35 were used to generate the super-resolution near-field effect. A nanoaperture was fabricated through direct laser writing on a large-area (200 × 200 mm2) multi-layered PCM. A photoresist nanopattern was fabricated on an 8-inch wafer via near-field nanolithography using the developed nanoaperture and an i-line commercial exposure system. Unlike other methods, this technique allows high-throughput large-area nanolithography and overcomes the gap-control issue between the probe array and the patterning surface. |
| first_indexed | 2024-04-11T11:23:49Z |
| format | Article |
| id | doaj.art-7b25eddf967d489394e3483e62650d27 |
| institution | Directory Open Access Journal |
| issn | 2055-7434 |
| language | English |
| last_indexed | 2024-04-11T11:23:49Z |
| publishDate | 2022-09-01 |
| publisher | Nature Publishing Group |
| record_format | Article |
| series | Microsystems & Nanoengineering |
| spelling | doaj.art-7b25eddf967d489394e3483e62650d272022-12-22T04:26:21ZengNature Publishing GroupMicrosystems & Nanoengineering2055-74342022-09-018111110.1038/s41378-022-00416-9Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fieldsChangsu Park0Soobin Hwang1Donghyun Kim2Nahyun Won3Runjia Han4Seonghyeon Jeon5Wooyoung Shim6Jiseok Lim7Chulmin Joo8Shinill Kang9School of Mechanical Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yonsei UniversityDepartment of Materials Science and Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yeungnam UniversitySchool of Mechanical Engineering, Yonsei UniversitySchool of Mechanical Engineering, Yonsei UniversityAbstract Laser direct-writing enables micro and nanoscale patterning, and is thus widely used for cutting-edge research and industrial applications. Various nanolithography methods, such as near-field, plasmonic, and scanning-probe lithography, are gaining increasing attention because they enable fabrication of high-resolution nanopatterns that are much smaller than the wavelength of light. However, conventional methods are limited by low throughput and scalability, and tend to use electron beams or focused-ion beams to create nanostructures. In this study, we developed a procedure for massively parallel direct writing of nanoapertures using a multi-optical probe system and super-resolution near-fields. A glass micro-Fresnel zone plate array, which is an ultra-precision far-field optical system, was designed and fabricated as the multi-optical probe system. As a chalcogenide phase-change material (PCM), multiple layers of Sb65Se35 were used to generate the super-resolution near-field effect. A nanoaperture was fabricated through direct laser writing on a large-area (200 × 200 mm2) multi-layered PCM. A photoresist nanopattern was fabricated on an 8-inch wafer via near-field nanolithography using the developed nanoaperture and an i-line commercial exposure system. Unlike other methods, this technique allows high-throughput large-area nanolithography and overcomes the gap-control issue between the probe array and the patterning surface.https://doi.org/10.1038/s41378-022-00416-9 |
| spellingShingle | Changsu Park Soobin Hwang Donghyun Kim Nahyun Won Runjia Han Seonghyeon Jeon Wooyoung Shim Jiseok Lim Chulmin Joo Shinill Kang Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields Microsystems & Nanoengineering |
| title | Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields |
| title_full | Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields |
| title_fullStr | Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields |
| title_full_unstemmed | Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields |
| title_short | Massively parallel direct writing of nanoapertures using multi-optical probes and super-resolution near-fields |
| title_sort | massively parallel direct writing of nanoapertures using multi optical probes and super resolution near fields |
| url | https://doi.org/10.1038/s41378-022-00416-9 |
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