The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation
The rather limited microstructural evolution in electrodeposited nanocrystalline Ni isothermally annealed at 453–493 K is investigated by using in situ X-ray diffraction technique. The nanostructural relaxation features roughly linear lattice contraction, based on which the kinetics analysis yields...
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| Format: | Article |
| Language: | English |
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Elsevier
2022-05-01
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| Series: | Journal of Materials Research and Technology |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785422005981 |
| _version_ | 1828490135068475392 |
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| author | Ze Chai Zhiyuan Yu Xiaoqi Chen |
| author_facet | Ze Chai Zhiyuan Yu Xiaoqi Chen |
| author_sort | Ze Chai |
| collection | DOAJ |
| description | The rather limited microstructural evolution in electrodeposited nanocrystalline Ni isothermally annealed at 453–493 K is investigated by using in situ X-ray diffraction technique. The nanostructural relaxation features roughly linear lattice contraction, based on which the kinetics analysis yields the activation energy of about 0.57 eV/atom, in good agreement with the fast diffusion of excess vacancies on the nonequilibrium surfaces and/or interfaces for Ni. The lattice contraction of Ni may result from a reduction in the grain boundary excess volume. The integral breadth of diffraction line profiles decreases with annealing time in an exponential manner, implying the gradual improvement of the lattice perfections during nanostructural relaxation. The microhardness evaluation demonstrates the initial invariance or slight softening and subsequent remarkable hardening of nanocrystalline Ni subjected to low-temperature annealing. |
| first_indexed | 2024-12-11T10:38:15Z |
| format | Article |
| id | doaj.art-7c5daa946a744569b9d75a8a834aebb8 |
| institution | Directory Open Access Journal |
| issn | 2238-7854 |
| language | English |
| last_indexed | 2024-12-11T10:38:15Z |
| publishDate | 2022-05-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Journal of Materials Research and Technology |
| spelling | doaj.art-7c5daa946a744569b9d75a8a834aebb82022-12-22T01:10:39ZengElsevierJournal of Materials Research and Technology2238-78542022-05-011840994103The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigationZe Chai0Zhiyuan Yu1Xiaoqi Chen2Shanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, 200240, PR ChinaShanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, 200240, PR ChinaShanghai Key Laboratory of Materials Laser Processing and Modification, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai, 200240, PR China; School of Engineering, Swinburne University of Technology, Hawthorn, Victoria, 3122, Australia; Corresponding author.The rather limited microstructural evolution in electrodeposited nanocrystalline Ni isothermally annealed at 453–493 K is investigated by using in situ X-ray diffraction technique. The nanostructural relaxation features roughly linear lattice contraction, based on which the kinetics analysis yields the activation energy of about 0.57 eV/atom, in good agreement with the fast diffusion of excess vacancies on the nonequilibrium surfaces and/or interfaces for Ni. The lattice contraction of Ni may result from a reduction in the grain boundary excess volume. The integral breadth of diffraction line profiles decreases with annealing time in an exponential manner, implying the gradual improvement of the lattice perfections during nanostructural relaxation. The microhardness evaluation demonstrates the initial invariance or slight softening and subsequent remarkable hardening of nanocrystalline Ni subjected to low-temperature annealing.http://www.sciencedirect.com/science/article/pii/S2238785422005981Nanocrystalline metalsMicrostructureRelaxationAnnealingX-ray diffraction |
| spellingShingle | Ze Chai Zhiyuan Yu Xiaoqi Chen The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation Journal of Materials Research and Technology Nanocrystalline metals Microstructure Relaxation Annealing X-ray diffraction |
| title | The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation |
| title_full | The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation |
| title_fullStr | The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation |
| title_full_unstemmed | The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation |
| title_short | The kinetics of nanostructural relaxation in electrodeposited Ni upon low-temperature annealing: an in-situ X-ray diffraction investigation |
| title_sort | kinetics of nanostructural relaxation in electrodeposited ni upon low temperature annealing an in situ x ray diffraction investigation |
| topic | Nanocrystalline metals Microstructure Relaxation Annealing X-ray diffraction |
| url | http://www.sciencedirect.com/science/article/pii/S2238785422005981 |
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