Overhang Saddle Fin Sidewall Structure for Highly Reliable DRAM Operation
A novel memory cell transistor structure based on a saddle fin-based DRAM is presented for highly reliable operations. The overhang saddle fin (oss-fin) active structure is formed by two steps of etching of the fin; isotropic etching for the short side and anisotropic etching for the long side of th...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2023-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10198229/ |