Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory

In contrast to conventional 2-dimensional (2D) NAND flash memory, in 3D NAND flash memory, cell-to-cell interference stemming from parasitic capacitance between the word-lines (WLs) is difficult to control because the number of WLs, achieved for better packing density, have been dramatically increas...

Full description

Bibliographic Details
Main Authors: Woo-Jin Jung, Jun-Young Park
Format: Article
Language:English
Published: MDPI AG 2021-10-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/12/11/1297
_version_ 1827676021707505664
author Woo-Jin Jung
Jun-Young Park
author_facet Woo-Jin Jung
Jun-Young Park
author_sort Woo-Jin Jung
collection DOAJ
description In contrast to conventional 2-dimensional (2D) NAND flash memory, in 3D NAND flash memory, cell-to-cell interference stemming from parasitic capacitance between the word-lines (WLs) is difficult to control because the number of WLs, achieved for better packing density, have been dramatically increased under limited height of NAND string. In this context, finding a novel approach based on dielectric engineering seems timely and applicable. This paper covers the voltage interference characteristics in 3D NAND with respect to dielectrics, then proposes an alternative cell structure to suppress such interference.
first_indexed 2024-03-10T05:15:54Z
format Article
id doaj.art-7d81118ead744c04afee6966bb63ae60
institution Directory Open Access Journal
issn 2072-666X
language English
last_indexed 2024-03-10T05:15:54Z
publishDate 2021-10-01
publisher MDPI AG
record_format Article
series Micromachines
spelling doaj.art-7d81118ead744c04afee6966bb63ae602023-11-23T00:25:24ZengMDPI AGMicromachines2072-666X2021-10-011211129710.3390/mi12111297Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash MemoryWoo-Jin Jung0Jun-Young Park1School of Electronics Engineering, Chungbuk National University, Chungdae-ro 1, Chungbuk, Cheongju 28644, KoreaSchool of Electronics Engineering, Chungbuk National University, Chungdae-ro 1, Chungbuk, Cheongju 28644, KoreaIn contrast to conventional 2-dimensional (2D) NAND flash memory, in 3D NAND flash memory, cell-to-cell interference stemming from parasitic capacitance between the word-lines (WLs) is difficult to control because the number of WLs, achieved for better packing density, have been dramatically increased under limited height of NAND string. In this context, finding a novel approach based on dielectric engineering seems timely and applicable. This paper covers the voltage interference characteristics in 3D NAND with respect to dielectrics, then proposes an alternative cell structure to suppress such interference.https://www.mdpi.com/2072-666X/12/11/1297dielectricsflash memoryinterferencecell-programmingvacuum dielectricV-NAND
spellingShingle Woo-Jin Jung
Jun-Young Park
Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory
Micromachines
dielectrics
flash memory
interference
cell-programming
vacuum dielectric
V-NAND
title Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory
title_full Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory
title_fullStr Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory
title_full_unstemmed Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory
title_short Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory
title_sort dielectric engineering to suppress cell to cell programming voltage interference in 3d nand flash memory
topic dielectrics
flash memory
interference
cell-programming
vacuum dielectric
V-NAND
url https://www.mdpi.com/2072-666X/12/11/1297
work_keys_str_mv AT woojinjung dielectricengineeringtosuppresscelltocellprogrammingvoltageinterferencein3dnandflashmemory
AT junyoungpark dielectricengineeringtosuppresscelltocellprogrammingvoltageinterferencein3dnandflashmemory