Potential for normally-off operation from GaN metal oxide semiconductor devices based upon semi-insulating GaN

The conditions for preparing normally-off GaN devices incorporating semi-insulating (SI) GaN materials are explored. The properties of SI GaN where carbon behaves as a deep level acceptor are predicted using a Shockley diagram. Metal-oxide-semiconductor (MOS) structures based upon these on SI-GaN la...

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Váldodahkkit: Yusuke Sakai, S. Lawrence Selvaraj, Osamu Oda, Takashi Egawa
Materiálatiipa: Artihkal
Giella:English
Almmustuhtton: AIP Publishing LLC 2013-08-01
Ráidu:AIP Advances
Liŋkkat:http://link.aip.org/link/doi/10.1063/1.4819245