Potential for normally-off operation from GaN metal oxide semiconductor devices based upon semi-insulating GaN
The conditions for preparing normally-off GaN devices incorporating semi-insulating (SI) GaN materials are explored. The properties of SI GaN where carbon behaves as a deep level acceptor are predicted using a Shockley diagram. Metal-oxide-semiconductor (MOS) structures based upon these on SI-GaN la...
Váldodahkkit: | , , , |
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Materiálatiipa: | Artihkal |
Giella: | English |
Almmustuhtton: |
AIP Publishing LLC
2013-08-01
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Ráidu: | AIP Advances |
Liŋkkat: | http://link.aip.org/link/doi/10.1063/1.4819245 |